应用 Precursors Packaged for Depositions Systems['Precursors Packaged for Depositions Systems General Description Atomic number of base material: 72 Hafnium Application Precursors Packaged for Depositions Systems
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Tetrakis(ethylmethylamido)hafnium(IV)
Dangerous GoodsCAS number:352535-01-4 molecular formula:C12H32HfN4
overview
compound introduction
Specs
| Chinese alias | 四(乙基甲基氨基)铪(IV), TEMAH | ||
| English alias | Tetrakis(ethylmethylamido)hafnium(IV), packaged for use in deposition systems | SCHEMBL237323 | Tetrakis(ethylmethylamido)hafnium(IV) | Hafnium tetrakis(ethylmethylamide) | Tetrakis(ethylmethylamino)hafnium 99.999% | MFCD03427130 | Tetrakis(ethylmethylami | ||
| CAS number | 352535-01-4 | molecular formula | C12H32HfN4 |
| molecular weight | - | Exact mass | 包装用于沉积系统 |
| PSA | - | logp | - |
numbering system
No numbering system information yet
physicochemical properties
No physical and chemical property information yet
Safety information
pictogram:
GHS06 , GHS05 , GHS07 , GHS02
Signal word:
Danger
Hazard Statement:
H315: 引起皮肤刺激 H319: 引起严重眼睛刺激 H335: 可能引起呼吸道刺激 H311: 皮肤接触有毒 H331: 吸入会中毒 H314: 造成严重的皮肤灼伤和眼睛损伤 H302: 吞食有害 H225: 高度易燃的液体和蒸气 H261: 与水接触释放出易燃气体
Statement of Preventive Measures:
P261: 避免吸入灰尘/烟雾/气体/雾/蒸汽/喷雾 P305+P351+P338: 如进入眼睛:用水小心冲洗几分钟。如戴隐形眼镜并可方便地取出,取出隐形眼镜。继续冲洗。 P280: 戴防护手套/穿防护服/戴防护眼罩/戴防护面具。 P231+P232: 在惰性气体中操作。防潮。 P370+P378: 火灾时:使用干砂、干粉或抗醇泡沫灭火。 P210: 远离热源,热表面,火花,明火和其他点火源。 - 禁止抽烟。 P302+P352: 如皮肤沾染:用水充分清洗。 P321: 特殊处理(请参阅此标签上的...)
UN Number:
3398
Production methods and uses
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Related
upstream information
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downstream information
No downstream information yet
MSDS
Found 1 shareMSDS
352535-01-4 | Tetrakis(ethylmethylamido)hafnium(IV).pdf





