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2-(methylamino)butanedioic acid

CAS number:17833-53-3    molecular formula:C5H9NO4

overview

compound introduction

N-甲基-DL-天冬氨酸是天冬氨酸的衍生物。

Specs

Chinese aliasN-甲基-DL-天冬氨酸
English aliasSCHEMBL167682 | 2-(Methylamino)succinic acid (Me-DL-Asp-OH) | BCP21209 | H-D-MeAsp-OH | MFCD00065918 | N-Me-Asp-OH | DS-14547 | HMS3675A03 | EU52DFC4WJ | NCGC00095062-01 | METHYL ASPARTIC ACID, DL- | NCGC00095062-02 | N-Methyl-DL-aspartic acid | HY-W01750
CAS number17833-53-3molecular formulaC5H9NO4
molecular weight147.13Exact mass≥98%
PSA86.6logp-3.4

numbering system

CAS17833-53-3
UNIIEU52DFC4WJ
HMDB IDHMDB0255174
ChEBI ID181378
WikidataQ27277365
ChEMBL IDCHEMBL275325
NSC NumberNSC Number: NSC16206
PubChem CID4376
Nikkaji NumberJ304.008I
DSSTox Substance IDDTXSID20859971
European Community (EC) Number964-924-4
PubChem Reference Collection SID505826399

physicochemical properties

XLogP3XLogP3-AA: -3.4
复杂性145
Exact Mass147.05315777
形式电荷0
重原子计数10
Molecular Weight147.13
Monoisotopic Mass147.05315777
可旋转键计数4
氢键供体计数3
氢键受体计数5
共价键单元计数1
同位素原子计数0
拓扑极性表面积86.6 Ų
定义键立体中心计数0
定义原子立体中心计数0
未定义键立体中心计数0
未定义原子手性中心计数1

Safety information

危害类别和分类:
特定靶器官毒性-单次接触 3级 (100%)

Production methods and uses

purpose
用途:
化妆品 -> 皮肤调理剂;抗静电剂;头发调理剂
工业应用参考:
工业分类参考:医药制造业。 应用场景参考:常见于生产制造场景,可作为主料、辅料、添加剂或工艺辅助材料参与配方与加工流程 。 作用参考:可作为基础工业材料参与合成、提纯或改性过程,为后续产品制造和工艺放大提供支撑 。 选型提示:精细化学品的稳定性不仅取决于材料本身,也与生产流程、仓储物流、追溯能力和管理水平密切相关 。

Related

upstream information

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downstream information

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MSDS

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