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Product introduction

应用 Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. It is commonly used for thin-film deposition, etching and analytical techniques. Application Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. It is commonly used for thin-film deposition, etching and analytical techniques.

Specs ⸢ View details ⸥

Chinese name

铬

English name

Chromium

Chinese alias

English alias

CAS number

7440-47-3

molecular formula

molecular weight

52 g/mol

Exact mass

≥99.95% metals basis

PSA

0.000 Å²

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