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Product introduction
应用 近来,已结合乙硅烷气体将四氟化锗用于直接在玻璃基底上制造硅锗微晶。锗和硅纳米晶体可发出强烈的可见光,因其在光电器件中的潜在应用价值而倍受关注。用于研究贵金属的室温氧化 和在玻璃基底上制造硅锗微晶。 Description Atomic number of base material: 32 GermaniumEmployed in studies on room-temperature oxidation of noble metals and the fabrication of SiGe crystallites on glass substrates.Germanium(IV) fluoride in combination with disilane gas has recently been used to fabricate SiGe crystallites directly on glass substrates. Intense visible light emission from Ge and Si nanocrystals is of particular interest because of potential uses in optoelectronic devices.
Chinese name
氟化锗(IV)
English name
Germanium(IV) fluoride
Chinese alias
-
English alias
Germanium tetrafluoride | GERMANIUM TETRAFLUORIDE [MI] | Germanium(IV) fluoride, 99.95% | GeF4 | 3-[1,1-biphenyl]-4-yl-3-oxopropanenitrile | Germanium(iv)fluoride | PPMWWXLUCOODDK-UHFFFAOYSA-N | Ge F4 | EINECS 232-011-3 | Germanium fluoride (GeF4) | Tetra
CAS number
7783-58-6
molecular formula
GeF4
molecular weight
148.63 g/mol
Exact mass
电子级
PSA
0.000 Ų
Logp
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Germanium(IV) fluoride electronic grade 5g

item number:G476353-5g
Product model:5g
level: electronic grade
Lead Time:30days
sold 733 Items
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